By Howard Huff,David Gilmer
Issues in relation to the high-K gate dielectric are one of the maximum demanding situations for the evolving overseas expertise Roadmap for Semiconductors (ITRS). greater than simply an ancient evaluate, this booklet will investigate prior and current methods on the topic of scaling the gate dielectric and their effect, in addition to the inventive instructions and drawing close demanding situations that may outline the way forward for gate dielectric scaling technology.
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